SUBSTRATE PROCESSING APPARATUS, TRANSFER METHOD OF SUBSTRATE SUPPORT, RECORDING MEDIUM, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING APPARATUS, TRANSFER METHOD OF SUBSTRATE SUPPORT, RECORDING MEDIUM, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

There is provided a technique that includes a process chamber in which a substrate is processed; a plurality of substrate supports configured to support the substrate; a rotatable table including a plurality of supports configured to support the plurality of substrate supports; and a heat conduction...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ABURATANI, Yukinori, Ohashi, Naofumi
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:There is provided a technique that includes a process chamber in which a substrate is processed; a plurality of substrate supports configured to support the substrate; a rotatable table including a plurality of supports configured to support the plurality of substrate supports; and a heat conduction insulator configured to suppress heat conduction between the plurality of supports.