SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

A technique includes a process chamber where a substrate-processing process including a heating process to a substrate is capable of being performed, a boat configured to support the substrate, a revolution part including a plurality of boat supports configured to support the boat, and capable of revolving the boat supports, a delivery chamber including a first area arranged below the process chamber, a second area where the substrate after the heating process is capable of waiting, and a third area where the substrate is capable of being delivered to and from an adjacent transfer chamber, among areas above the revolution part, a cooler capable of performing a cooling process to the substrate in the second area, and a controller capable of controlling a revolution operation or a movement operation.