REMOVABLE MASK LAYER TO REDUCE OVERHANG DURING RE-SPUTTER PROCESS IN PVD CHAMBERS

Apparatus and methods for processes of depositing a film on a substrate in an electronic device fabrication process are provided herein, and more particularly, apparatus and methods for improving deposited film uniformity within high aspect ratio features. In some embodiments, a metal layer depositi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HOU, Wenting, LEI, Jianxin
Format: Patent
Sprache:eng
Schlagworte:
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