TEMPERATURE CONTROL METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, TEMPERATURE CONTROL SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM

TEMPERATURE CONTROL METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, TEMPERATURE CONTROL SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM

According to one embodiment of the present disclosure, there is provided a technique of controlling a temperature of a substrate by using a moving average value calculated by performing a moving average process on temperature values detected by a temperature sensor installed to be rotatable together...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Shigematsu, Seiya, Yamaguchi, Hideto, Nakanishi, Kento
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:According to one embodiment of the present disclosure, there is provided a technique of controlling a temperature of a substrate by using a moving average value calculated by performing a moving average process on temperature values detected by a temperature sensor installed to be rotatable together with a holder configured to hold the substrate.