COMPOSITION FOR DEFLUXING ELECTRONIC ASSEMBLIES

The invention relates to a composition intended for the cleaning of contaminants and flux residues on electronic assemblies, particularly solder cream residue. Said composition comprises:from 20% to 99.5% by weight of a main solvent consisting of at least a C6-C15 glycol ether, and optionally a seco...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: D'AMICO, Marine, DEHON, Christophe, LECOMTE, Laura Jacqueline
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention relates to a composition intended for the cleaning of contaminants and flux residues on electronic assemblies, particularly solder cream residue. Said composition comprises:from 20% to 99.5% by weight of a main solvent consisting of at least a C6-C15 glycol ether, and optionally a secondary solvent,from 0.5% to 20% by weight of a selected acid additive which is a phosphoric acid ester. The invention also relates to a defluxing product incorporating said composition, as well as to the defluxing methods using these products