SUBSTRATE TRANSFERRING APPARATUS, AND LIQUID PROCESSING APPARATUS AND SUBSTRATE PROCESSING EQUIPMENT INCLUDING SAME

Proposed is a substrate transferring apparatus, and a liquid processing apparatus and substrate processing equipment including the same, which prevent a pattern leaning phenomenon during a substrate processing process. The substrate transferring apparatus that transfers substrates between cleaning t...

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Bibliographische Detailangaben
Hauptverfasser: LEE, Eun Jung, YOUN, Hee Jun, JANG, Young Jin, LIM, Jun Hyun, PARK, Gui Su, CHOI, Seul Gi
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Proposed is a substrate transferring apparatus, and a liquid processing apparatus and substrate processing equipment including the same, which prevent a pattern leaning phenomenon during a substrate processing process. The substrate transferring apparatus that transfers substrates between cleaning tanks in the batch-type liquid processing apparatus includes a rail extended on a ceiling of a first cleaning tank in which a first processing liquid is stored and a second cleaning tank in which a second processing liquid is stored, a crane moving along the rail, and a vessel configured to be moved vertically by the crane. The vessel may include a first sub vessel and a second sub vessel that combine with each other to form a space for accommodating a substrate immersed in the first processing liquid.