CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD OF REPLACING POLISHING PAD USING THE SAME

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD OF REPLACING POLISHING PAD USING THE SAME

The present disclosure relates to a chemical mechanical polishing apparatus and a method of replacing a polishing pad using the same. The chemical mechanical polishing apparatus includes: a polishing table; a polishing pad attachment feature on a surface of the polishing table; a polishing pad suppl...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Min, Chungki, Kwon, Donghoon
Format: Patent
Sprache:eng
Schlagworte:
DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TRANSPORTING
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Beschreibung
Zusammenfassung:The present disclosure relates to a chemical mechanical polishing apparatus and a method of replacing a polishing pad using the same. The chemical mechanical polishing apparatus includes: a polishing table; a polishing pad attachment feature on a surface of the polishing table; a polishing pad supply area outside the polishing table; and a polishing pad carrier configured to move a polishing pad from the polishing pad supply area to the polishing pad attachment feature, wherein the polishing pad attachment feature includes a magnetic feature and/or an adsorption feature to attach the polishing pad to the polishing table.