ION BEAM DEVICE AND EMITTER TIP MILLING METHOD

An object of the invention is to provide an ion beam device capable of sharpening an emitter tip end to an atomic level with high reproducibility while reducing a device downtime. The ion beam device according to the invention measures a current of a helium ion beam, and switches, according to a mea...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MATSUBARA, Shinichi, ARAI, Noriaki
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An object of the invention is to provide an ion beam device capable of sharpening an emitter tip end to an atomic level with high reproducibility while reducing a device downtime. The ion beam device according to the invention measures a current of a helium ion beam, and switches, according to a measurement result, between a first operation of adjusting a flow rate of a nitrogen gas or an oxygen gas and a second operation of adjusting an extraction voltage.