POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE COMPRISING SAME

A photosensitive resin composition includes an alkali-soluble resin including at least one structure selected from the group consisting of polyamic acid, polyamic ester, and polyimide; two or more thermal crosslinkable compounds; a photosensitizer; and a solvent. The photosensitive resin composition...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, Dong Myung, JANG, Gun Seok, YOUN, Hyoc Min, OH, Nu Ri, YEO, Tai Hoon, SONG, In Ho, LEE, Sun Hee, PARK, Ah Rum, LEE, Seok Hyun
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	A photosensitive resin composition includes an alkali-soluble resin including at least one structure selected from the group consisting of polyamic acid, polyamic ester, and polyimide; two or more thermal crosslinkable compounds; a photosensitizer; and a solvent. The photosensitive resin composition has excellent sensitivity, film residual rate, adhesive force, chemical resistance and heat resistance; and a display device includes a component cured from such a photosensitive resin composition.