SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

The disclosed substrate support includes a first region, a second region, a first electrode, and a second electrode. The first region is configured to hold a substrate placed thereon. The second region is provided to surround the first region and configured to hold an edge ring placed thereon. The f...

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Bibliographische Detailangaben
Hauptverfasser:	YAMAGUCHI, Shin, SUGAWARA, Tsuguto, SASAKI, Yasuharu, KOIZUMI, Katsuyuki, TAMURA, Hajime
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATION
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Beschreibung
Zusammenfassung:	The disclosed substrate support includes a first region, a second region, a first electrode, and a second electrode. The first region is configured to hold a substrate placed thereon. The second region is provided to surround the first region and configured to hold an edge ring placed thereon. The first electrode is provided in the first region to receive a first electrical bias. The second electrode is provided in at least the second region to receive a second electrical bias. The second electrode extends below the first electrode to face the first electrode within the first region.