METHODS FOR CALIBRATING AN OPTICAL EMISSION SPECTROMETER

METHODS FOR CALIBRATING AN OPTICAL EMISSION SPECTROMETER

One or more embodiments described herein generally relate to systems and methods for calibrating an optical emission spectrometer (OES) used for processing semiconductor substrates. In embodiments herein, a light fixture is mounted to a plate within a process chamber. A light source is positioned wi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LO, Kin Pong, HAWRYLCHAK, Lara, BEVAN, Malcolm J, GUARINI, Theresa Kramer, HWANG, Bernard L, LIU, Wei
Format: Patent
Sprache:eng
Schlagworte:
COLORIMETRY
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
PHYSICS
RADIATION PYROMETRY
TESTING
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Beschreibung
Zusammenfassung:One or more embodiments described herein generally relate to systems and methods for calibrating an optical emission spectrometer (OES) used for processing semiconductor substrates. In embodiments herein, a light fixture is mounted to a plate within a process chamber. A light source is positioned within the light fixture such that it provides an optical path that projects directly at a window through which the OES looks into the process chamber for its reading. When the light source is on, the OES measures the optical intensity of radiation from the light source. To calibrate the OES, the optical intensity of the light source is compared at two separate times when the light source is on. If the optical intensity of radiation at the first time is different than the optical intensity of radiation at the second time, the OES is modified.