DEPOSITION APPARATUS INCLUDING MASK ASSEMBLY AND SHAPE CORRECTION METHOD FOR MASK ASSEMBLY

A deposition apparatus includes: a chamber; a stage defining a stage-opening therein and disposed inside the chamber; a frame disposed on the stage and defining a frame-opening therein corresponding to the stage-opening; a mask coupled to the frame and defining a plurality of deposition openings the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	LEE, JONGDAE, HONG, SEUNGJU, WOO, Mina, JANG, WONYOUNG, MIN, SOOHYUN
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A deposition apparatus includes: a chamber; a stage defining a stage-opening therein and disposed inside the chamber; a frame disposed on the stage and defining a frame-opening therein corresponding to the stage-opening; a mask coupled to the frame and defining a plurality of deposition openings therein corresponding to the frame-opening; a deposition source configured to spray a deposition material to the frame-opening; alignment units coupled to the stage and contacting the frame to move a position of the frame on the stage; and correction units each of which includes a magnetic force part disposed on the stage and adjacent to the frame, and a driving part configured to provide a magnetic force to the magnetic force part, wherein the correction units are configured to change a shape of the frame, and are coupled to the stage.