POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS

A polymer including a first repeating unit derived from a first monomer represented by formula (1); and a second repeating unit comprising an acid labile group, a hydroxyaryl group, a sulfonamide group, a fluoroalcohol group, or a combination thereof,wherein, in formula (1), P is a polymerizable gro...

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Bibliographische Detailangaben
Hauptverfasser:	Hoelzel, Conner A, Cameron, James F, Aqad, Emad, Cui, Li, Park, Jong Keun
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	A polymer including a first repeating unit derived from a first monomer represented by formula (1); and a second repeating unit comprising an acid labile group, a hydroxyaryl group, a sulfonamide group, a fluoroalcohol group, or a combination thereof,wherein, in formula (1), P is a polymerizable group comprising an ethylenically unsaturated carbon-carbon double bond; L1 is a single bond or a linking group; Ar is a substituted or unsubstituted C6-30 aromatic group or a substituted or unsubstituted C4-30 heteroaromatic group; X is O or S; A is a group selected from -O-, -S-, -S(O)-, -S(O)2-, -C(O)-, -C(S)-, or -N(Ra)-; Ra is hydrogen or a non-hydrogen substituent; and R1 and R2 are each as defined herein, wherein the first repeating unit and the second repeating unit are structurally different.