METHOD AND SYSTEM FOR SELECTIVE RECOVERY OF MONOCHLOROSILANE AND DICHLOROSILANE IN POLYSILICON PRODUCTION PROCESS
A method and system for selectively recovering monochlorosilane and dichlorosilane from polysilicon production process are provided. The system and method selectively recover the monochlorosilane and the dichlorosilane contained in an exhaust stream discharged from a chemical vapor deposition unit f...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Papp, Kevin Smith, Joah Flynn, Joshua Fero, Chad |
| description | A method and system for selectively recovering monochlorosilane and dichlorosilane from polysilicon production process are provided. The system and method selectively recover the monochlorosilane and the dichlorosilane contained in an exhaust stream discharged from a chemical vapor deposition unit for a polysilicon production process and the monochlorosilanes and the dichlorosilanes may be obtained with minimal capital investment or complexity. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2024182497A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2024182497A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2024182497A13</originalsourceid><addsrcrecordid>eNqNjDELwjAUhLs4iPofHjgLthbUsSSvJJDmSV5ayFSKxEm0Uv8_BnVxc7rvjrubZ48GvSIJlZXAgT02UJMDRoPC6w7BoaAOXQCqoSFLQhlyxNpUFt8rqX8ibeFEJiSnBSV2JNv09EGBzMtsdhmuU1x9dZGta_RCbeJ47-M0Dud4i8--5WJblPmhKI_7Kt_913oBOz45sw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD AND SYSTEM FOR SELECTIVE RECOVERY OF MONOCHLOROSILANE AND DICHLOROSILANE IN POLYSILICON PRODUCTION PROCESS</title><source>esp@cenet</source><creator>Papp, Kevin ; Smith, Joah ; Flynn, Joshua ; Fero, Chad</creator><creatorcontrib>Papp, Kevin ; Smith, Joah ; Flynn, Joshua ; Fero, Chad</creatorcontrib><description>A method and system for selectively recovering monochlorosilane and dichlorosilane from polysilicon production process are provided. The system and method selectively recover the monochlorosilane and the dichlorosilane contained in an exhaust stream discharged from a chemical vapor deposition unit for a polysilicon production process and the monochlorosilanes and the dichlorosilanes may be obtained with minimal capital investment or complexity.</description><language>eng</language><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ; CHEMISTRY ; COMPOUNDS THEREOF ; INORGANIC CHEMISTRY ; METALLURGY ; NON-METALLIC ELEMENTS ; ORGANIC CHEMISTRY ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEPARATION ; TRANSPORTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240606&DB=EPODOC&CC=US&NR=2024182497A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240606&DB=EPODOC&CC=US&NR=2024182497A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Papp, Kevin</creatorcontrib><creatorcontrib>Smith, Joah</creatorcontrib><creatorcontrib>Flynn, Joshua</creatorcontrib><creatorcontrib>Fero, Chad</creatorcontrib><title>METHOD AND SYSTEM FOR SELECTIVE RECOVERY OF MONOCHLOROSILANE AND DICHLOROSILANE IN POLYSILICON PRODUCTION PROCESS</title><description>A method and system for selectively recovering monochlorosilane and dichlorosilane from polysilicon production process are provided. The system and method selectively recover the monochlorosilane and the dichlorosilane contained in an exhaust stream discharged from a chemical vapor deposition unit for a polysilicon production process and the monochlorosilanes and the dichlorosilanes may be obtained with minimal capital investment or complexity.</description><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</subject><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>INORGANIC CHEMISTRY</subject><subject>METALLURGY</subject><subject>NON-METALLIC ELEMENTS</subject><subject>ORGANIC CHEMISTRY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEPARATION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjDELwjAUhLs4iPofHjgLthbUsSSvJJDmSV5ayFSKxEm0Uv8_BnVxc7rvjrubZ48GvSIJlZXAgT02UJMDRoPC6w7BoaAOXQCqoSFLQhlyxNpUFt8rqX8ibeFEJiSnBSV2JNv09EGBzMtsdhmuU1x9dZGta_RCbeJ47-M0Dud4i8--5WJblPmhKI_7Kt_913oBOz45sw</recordid><startdate>20240606</startdate><enddate>20240606</enddate><creator>Papp, Kevin</creator><creator>Smith, Joah</creator><creator>Flynn, Joshua</creator><creator>Fero, Chad</creator><scope>EVB</scope></search><sort><creationdate>20240606</creationdate><title>METHOD AND SYSTEM FOR SELECTIVE RECOVERY OF MONOCHLOROSILANE AND DICHLOROSILANE IN POLYSILICON PRODUCTION PROCESS</title><author>Papp, Kevin ; Smith, Joah ; Flynn, Joshua ; Fero, Chad</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2024182497A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</topic><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>INORGANIC CHEMISTRY</topic><topic>METALLURGY</topic><topic>NON-METALLIC ELEMENTS</topic><topic>ORGANIC CHEMISTRY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEPARATION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Papp, Kevin</creatorcontrib><creatorcontrib>Smith, Joah</creatorcontrib><creatorcontrib>Flynn, Joshua</creatorcontrib><creatorcontrib>Fero, Chad</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Papp, Kevin</au><au>Smith, Joah</au><au>Flynn, Joshua</au><au>Fero, Chad</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD AND SYSTEM FOR SELECTIVE RECOVERY OF MONOCHLOROSILANE AND DICHLOROSILANE IN POLYSILICON PRODUCTION PROCESS</title><date>2024-06-06</date><risdate>2024</risdate><abstract>A method and system for selectively recovering monochlorosilane and dichlorosilane from polysilicon production process are provided. The system and method selectively recover the monochlorosilane and the dichlorosilane contained in an exhaust stream discharged from a chemical vapor deposition unit for a polysilicon production process and the monochlorosilanes and the dichlorosilanes may be obtained with minimal capital investment or complexity.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2024182497A1 |
| source | esp@cenet |
| subjects | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS ORGANIC CHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TRANSPORTING |
| title | METHOD AND SYSTEM FOR SELECTIVE RECOVERY OF MONOCHLOROSILANE AND DICHLOROSILANE IN POLYSILICON PRODUCTION PROCESS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T14%3A00%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Papp,%20Kevin&rft.date=2024-06-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2024182497A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |