METHOD AND SYSTEM FOR SELECTIVE RECOVERY OF MONOCHLOROSILANE AND DICHLOROSILANE IN POLYSILICON PRODUCTION PROCESS

METHOD AND SYSTEM FOR SELECTIVE RECOVERY OF MONOCHLOROSILANE AND DICHLOROSILANE IN POLYSILICON PRODUCTION PROCESS

A method and system for selectively recovering monochlorosilane and dichlorosilane from polysilicon production process are provided. The system and method selectively recover the monochlorosilane and the dichlorosilane contained in an exhaust stream discharged from a chemical vapor deposition unit f...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Papp, Kevin, Smith, Joah, Flynn, Joshua, Fero, Chad
Format: Patent
Sprache:eng
Schlagworte:
ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
ORGANIC CHEMISTRY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
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Beschreibung
Zusammenfassung:A method and system for selectively recovering monochlorosilane and dichlorosilane from polysilicon production process are provided. The system and method selectively recover the monochlorosilane and the dichlorosilane contained in an exhaust stream discharged from a chemical vapor deposition unit for a polysilicon production process and the monochlorosilanes and the dichlorosilanes may be obtained with minimal capital investment or complexity.