METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, GAS SUPPLY METHOD, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, GAS SUPPLY METHOD, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

It is possible to suppress a metal contamination of a substrate due to a corrosion of a piping. There is provided a technique that includes: (a) vaporizing a source material stored in a tank by introducing an inert gas through a primary piping of the tank, and supplying a vaporized gas generated by...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ABURATANI, Yukinori, NAKATANI, Kimihiko, HASHIMOTO, Yoshitomo
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:It is possible to suppress a metal contamination of a substrate due to a corrosion of a piping. There is provided a technique that includes: (a) vaporizing a source material stored in a tank by introducing an inert gas through a primary piping of the tank, and supplying a vaporized gas generated by vaporizing the source material into a process chamber through a secondary piping of the tank; and (b) supplying an oxygen-containing gas to the secondary piping through which the vaporized gas has passed via a bypass line connecting the primary piping and the secondary piping such that the oxygen-containing gas is supplied without passing through the tank.