TEMPERATURE CONDITIONING SYSTEM, A LITHOGRAPHIC APPARATUS AND A METHOD OF TEMPERATURE CONDITIONING AN OBJECT

A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure differen...

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Bibliographische Detailangaben
Hauptverfasser:	WATERSON, Nicholas Peter, JACOBS, Johannes Henricus Wilhelmus, VAN SANTVOORT, Johannes, Franciscus Martinus, VAN DE MEERENDONK, Remco, PEKELDER, Sven, KLUGKIST, Joost André, VAN DER NET, Antonius Johannus, JANSSEN, Gerardus Arnoldus Hendricus, Franciscus, NAKÍBOGLU, Günes, VAN LIPZIG, Jeroen, Peterus Johannes, OUDES, Jaap, DIRECKS, Daniel Jozef, Maria
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.