PARTICLE INSPECTION DEVICE AND PARTICLE INSPECTION METHOD

The present invention reduces erroneous detection due to diffracted light from a pattern, and provides a particle inspection device that inspects a particle adhering to a substrate on which a pattern is formed, including: a light irradiation unit that linearly scans and irradiate the substrate with a laser beam; a first light detection unit and a second light detection unit that detect light reflected by the substrate; and a particle detection unit that detects the particle based on output signals of the first light detection unit and the second light detection unit, in which the first light detection unit and the second light detection unit are arranged such that a light reception elevation angle α with respect to a surface of the substrate and a light reception horizontal angle β with respect to a scanning direction of the laser beam are different from each other.