ASYMMETRIC UV EXPOSURE METHOD

An asymmetric UV exposure method, and a metal mesh sensor manufactured using the same are described. The method includes applying a UV-curable coating #1 on one side of an optically transparent substrate; applying a UV-curable coating #2 on the other side of the optically transparent substrate; and...

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Bibliographische Detailangaben
Hauptverfasser:	WANG, Jun, LIU, Jiang, HUANG, Tengwei, JIANG, Jonathan
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An asymmetric UV exposure method, and a metal mesh sensor manufactured using the same are described. The method includes applying a UV-curable coating #1 on one side of an optically transparent substrate; applying a UV-curable coating #2 on the other side of the optically transparent substrate; and exposing both sides of the optically transparent substrate to UV light simultaneously. The UV-curable coating #1 and the UV-curable coating #2 have UV absorption peaks at different wavelengths. The method not only allows a greater choice of optically transparent substrates for manufacturing metal mesh touch sensors, but also enables better flexibility and improved optical properties.