BRUSH FOR CLEANING A WAFER

A brush for cleaning a wafer includes a core extending lengthwise in a first direction, a brushing roller arranged on an outer circumferential surface of the core and having a first region and a second region defined at an outer circumferential surface of the brushing roller, a plurality of first brushing bristles extending from the first region in a radial direction of the brushing roller, wherein the radial direction of the brushing roller is perpendicular to the first direction, and a plurality of second brushing bristles extending from the second region in the radial direction of the brushing roller. Each of the plurality of first brushing bristles has a first shape, and each of the plurality of second brushing bristles has a second shape different from the first shape.