DETECTION AND ANALYSIS OF SUBSTRATE SUPPORT AND PRE-HEAT RING IN A PROCESS CHAMBER VIA IMAGING

DETECTION AND ANALYSIS OF SUBSTRATE SUPPORT AND PRE-HEAT RING IN A PROCESS CHAMBER VIA IMAGING

An apparatus, method, and system for identifying and obtaining information related to a substrate support and/or a pre-heat ring in a process chamber via imaging and image processing. In an embodiment, a substrate support is provided. The substrate support generally includes a top surface configured...

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Bibliographische Detailangaben
Hauptverfasser: SALINAS, Martin Jeffrey, CHEN, Hui, LUAN, Xinning, CONG, Zhepeng, ATANOS, Ashur J
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:An apparatus, method, and system for identifying and obtaining information related to a substrate support and/or a pre-heat ring in a process chamber via imaging and image processing. In an embodiment, a substrate support is provided. The substrate support generally includes a top surface configured to receive a substrate in a process chamber and a marking feature disposed on the top surface of the substrate support, the marking feature configured to be detectable by an imaging apparatus coupled to the process chamber to provide information related to the substrate support via imaging when the substrate support is disposed within the process chamber.