Block Copolymer Composition And Methods Of Preparation Thereof

The disclosure relates to a styrenic block copolymer (SBC) having at least a triblock, and a diblock structure with a diblock content of up to 50 wt. %. The SBC is suitable for film applications requiring soft stretch properties even without adding oil, pressure sensitive adhesive applications, phot...

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Bibliographische Detailangaben
Hauptverfasser:	Maris, Catherine A. L, Muyldermans, Xavier D.D.J, Dupont, Martine
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON DYES GENERAL PROCESSES OF COMPOUNDING MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ORGANIC MACROMOLECULAR COMPOUNDS PAINTS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS AS ADHESIVES WORKING-UP
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Beschreibung
Zusammenfassung:	The disclosure relates to a styrenic block copolymer (SBC) having at least a triblock, and a diblock structure with a diblock content of up to 50 wt. %. The SBC is suitable for film applications requiring soft stretch properties even without adding oil, pressure sensitive adhesive applications, photocurable (photopolymerizable) printing plates, etc. Additional components can be added to the SBC, accordingly, forming the end-use (application) composition.