TOTAL OR LOCAL THICKNESS VARIATION FOR OPTICAL DEVICES

Embodiments of the present disclosure generally relate to methods for forming a waveguide. Methods may include measuring a waveguide substrate, the waveguide having a substrate thickness distribution; and depositing an index-matched layer onto a surface of the waveguide, the index-matched layer havi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	BHARGAVA, Samarth, LUO, Yingdong, MESSER, Kevin, YANG, Jingyi, ZHANG, Daihua, DENG, Xiaopei, GODET, Ludovic, SELL, David Alexander, HOURANI, Rami, YAO, Zhengping
Format:	Patent
Sprache:	eng
Schlagworte:	OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS
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Beschreibung
Zusammenfassung:	Embodiments of the present disclosure generally relate to methods for forming a waveguide. Methods may include measuring a waveguide substrate, the waveguide having a substrate thickness distribution; and depositing an index-matched layer onto a surface of the waveguide, the index-matched layer having a first surface disposed on the waveguide substrate and a second surface opposing the first surface, wherein the index-matched layer is disposed only over a portion of the waveguide substrate, and a device slope of a second surface of the index-matched layer is substantially the same as the waveguide slope of the first surface of the waveguide.