COATED CUTTING TOOL

A coated cutting tool and a method to manufacture, and the use of the same is provided. The coated cutting tool includes of a substrate and a coating including a physical vapor deposition (PVD) deposited Ti,Al-based nitride layer having a thickness of at least 1.0 μm. The PVD deposited Ti,Al-based n...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	LAURIDSEN, Jonas, ANDERSSON, Jon, ALM, Oscar, ENGSTROM, Hindrik, LARSSON, Tommy
Format:	Patent
Sprache:	eng
Schlagworte:	BORING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR METALLURGY PERFORMING OPERATIONS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING TURNING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A coated cutting tool and a method to manufacture, and the use of the same is provided. The coated cutting tool includes of a substrate and a coating including a physical vapor deposition (PVD) deposited Ti,Al-based nitride layer having a thickness of at least 1.0 μm. The PVD deposited Ti,Al-based nitride layer has at least one layer of TiAlN. The coating further includes a CVD deposited layer of TiN located between the substrate and the PVD deposited Ti,Al-based nitride layer. The CVD deposited layer of TiN is in contact with both the substrate and the PVD deposited Ti,Al-based nitride layer. The method for manufacturing a coated cutting tool includes growing a TiN layer by CVD on the substrate, and growing a Ti,Al-based nitride layer by PVD on the TiN layer.