SEMICONDUCTOR STRUCTURE AND FORMING METHOD THEREFOR, AND MEMORY

SEMICONDUCTOR STRUCTURE AND FORMING METHOD THEREFOR, AND MEMORY

A semiconductor structure includes a substrate and a word line structure. The substrate includes an array region and a peripheral region. The word line structure includes a first conductive layer disposed on the substrate, and the first conductive layer penetrates the array region and extends to the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Lin, Chih-Cheng, LI, Ran, Duan, Leilei, Zang, Biao
Format: Patent
Sprache:eng
Schlagworte:
ELECTRICITY
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Beschreibung
Zusammenfassung:A semiconductor structure includes a substrate and a word line structure. The substrate includes an array region and a peripheral region. The word line structure includes a first conductive layer disposed on the substrate, and the first conductive layer penetrates the array region and extends to the peripheral region in a first direction. In a normal direction of the substrate, a height of the first conductive layer on a surface of the peripheral region is higher than a height of the first conductive layer on a surface of the array region.