COMPACT REMOTE PLASMA SOURCE FOR HDP CVD CHAMBERS

This disclosure relates to systems and apparatuses for the cleaning of HDP chambers, and more specifically, for remote plasma source ("RPS") systems used for the generation and delivery of cleaning radicals to the interior of such chambers for the purposes of reacting with and removing materials deposited therein during the chambers' normal operation, wherein the plasma source and the power supply of the RPS system are decoupled from one another, the form factor of the plasma source is such that it may be mounted in immediate proximity to the target chamber, and wherein the plasma source uses variable capacitors in order to tune the RF signals it generates to the impedance of the conductive coil, such as may be due to changes in gas pressures inside of the system, so that the RF load in the coil may be balanced in near-real time.