PHOTOSENSITIVE PASTE, METHOD FOR FORMING WIRING PATTERN, METHOD FOR PRODUCING ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT

A photosensitive paste contains a photoinitiator, a photopolymerizable monomer, an alkali-soluble polymer, an inorganic powder, and a radical scavenger. A method for forming a wiring pattern includes a step of forming a photosensitive paste film by applying the photosensitive paste that has electric...

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Bibliographische Detailangaben
1. Verfasser:	MIYAKE, Isamu
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INDUCTANCES MAGNETS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES TRANSFORMERS
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Beschreibung
Zusammenfassung:	A photosensitive paste contains a photoinitiator, a photopolymerizable monomer, an alkali-soluble polymer, an inorganic powder, and a radical scavenger. A method for forming a wiring pattern includes a step of forming a photosensitive paste film by applying the photosensitive paste that has electrical conductivity to an insulating sheet; a step of irradiating a portion of the photosensitive paste film with an active energy ray; and a step of forming a wiring pattern by removing an uncured portion of the photosensitive paste film.