LOW-COST NOVEL ADSORBENT WITH HIGH CHLORIDE REMOVAL CAPACITY

The present invention discloses an adsorbent composition for removing halogen-containing contaminants such as hydrogen chloride from gas streams and a process for its formation. The adsorbent composition comprises an active metal component and a carrier or binder. The active metal component is selec...

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Bibliographische Detailangaben
Hauptverfasser:	Lalljee, Iskander Altaf, Ravindran, Kishore, Babu, Surya Prakash, Rugmini, Sreekala, Gopinath, Rajesh, Lalljee, Arshia Altaf, Sree, Rekha
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention discloses an adsorbent composition for removing halogen-containing contaminants such as hydrogen chloride from gas streams and a process for its formation. The adsorbent composition comprises an active metal component and a carrier or binder. The active metal component is selected from the group consisting of sodium, potassium, magnesium, calcium and barium and the carrier/binder is selected from a group of clay materials like sepiolite, montmorillonite, kaolin or attapulgite.