MEMORY DEVICE INCLUDING STAIRCASE STRUCTURES AND ADJACENT TRENCH STRUCTURES

Some embodiments include apparatuses and methods of forming the apparatuses. One of the apparatuses includes tiers located one over another; a first staircase structure formed in the tiers; a second staircase structure formed in the tiers adjacent the first staircase structure, respective portions of conductive materials in the tiers forming a part of the first and second staircase structure and a part of respective control gates associated with memory cells; a first trench structure formed in the tiers adjacent the first staircase structure and the second staircase structure, the first trench structure including length in a direction from the first staircase structure to the second staircase structure; and a second trench structure formed in the tiers adjacent the first trench structure, the second trench structure including a length in the direction from the first staircase structure to the second staircase structure.