VERTICAL SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR

A vertical semiconductor device and method for manufacturing the same is provided. The semiconductor device includes a body with a substrate and an epitaxial layer on the substrate, the layer includes a first region of a first conductivity type, and a second region of a second different conductivity type, the second region is arranged opposite to the substrate with respect to the first region, and when viewed in a first direction from the layer to the substrate, the first region and the second region each extend across an entire area of the body. The device further includes a trench arranged in the body, extending through the second region and at least partially into the first region, thereby dividing the second region into an inner and an outer portion that are mutually electrically isolated, and a first conductive contact on the second region to enable electrically accessing the inner portion.