ACTIVE AREA SALICIDATION FOR NMOS AND PMOS DEVICES

A variety of applications can include apparatus having p-channel metal-oxide-semiconductor (PMOS) transistors and n-channel metal-oxide-semiconductor (NMOS) transistors with different metal silicide contacts. The active area of the NMOS transistor can include a first metal silicide having a first me...

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Bibliographische Detailangaben
Hauptverfasser: Weimer, Ronald Allen, Petz, Christopher W, Miyashita, Toshihiko, Mocuta, Dan Mihai
Format: Patent
Sprache:eng
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