SYSTEM AND METHOD FOR PERFORMING PROCESS MODEL CALIBRATION IN A VIRTUAL SEMICONDUCTOR DEVICE FABRICATION ENVIRONMENT

SYSTEM AND METHOD FOR PERFORMING PROCESS MODEL CALIBRATION IN A VIRTUAL SEMICONDUCTOR DEVICE FABRICATION ENVIRONMENT

A virtual fabrication environment for semiconductor device fabrication that includes an analytics module for performing key parameter identification, process model calibration and variability analysis is discussed.

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Bibliographische Detailangaben
Hauptverfasser: Fried, David M, Egan, William J, Kunwar, Anshuman, Greiner, Kenneth B
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
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Zusammenfassung:A virtual fabrication environment for semiconductor device fabrication that includes an analytics module for performing key parameter identification, process model calibration and variability analysis is discussed.