FILM REACTOR FOR A GAS-LIQUID, IN PARTICULAR A SULFONATION, OR SULFATATION, REACTION

A continuous falling film reactor includes a reactor body including chambers for a reaction between first and second reagents. The chambers have a respective inner surface, for the sliding of the first reagent in the form of a thin film, or layer, a device for introducing the first reagent, in parti...

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Bibliographische Detailangaben
Hauptverfasser:	MILICIA, Antonino, ADAMI, Icilio, DI BENEDETTO, Rocco Alessandro, PELI, Loris, NAVA, Fabrizio, SEBASTIANI, Ilio, GHIONI, Federico Piero
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	A continuous falling film reactor includes a reactor body including chambers for a reaction between first and second reagents. The chambers have a respective inner surface, for the sliding of the first reagent in the form of a thin film, or layer, a device for introducing the first reagent, in particular in the liquid phase, especially in the form of an organic raw material, into the respective chamber and a device for inputting the second reagent, in particular in the gaseous phase, especially in the form of sulphuric anhydride, in the respective one of the chambers. A head introduces the first reagent, in the respective chamber, which head-includes a corresponding nozzle so calibrated to cause a predetermined load loss of said first reagent.