HOLLOW CATHODE SYSTEM FOR GENERATING A PLASMA AND METHOD FOR OPERATING SUCH A HOLLOW CATHODE SYSTEM

A hollow cathode system generates a plasma. The system includes an anode device, a power supply for applying an electric current between a cathode tube and the anode device, and at least one gas reservoir for supplying the gas flowing through the cathode tube are used, in which at least two cathode...

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Bibliographische Detailangaben
Hauptverfasser:	Flaske, Henrik, Zimmermann, Burkhard, Gösta, Mattausch, Björn, Meyer, Kirchhoff, Volker, Kubusch, Jörg, Labitzke, Rainer, Weiss, Stefan
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A hollow cathode system generates a plasma. The system includes an anode device, a power supply for applying an electric current between a cathode tube and the anode device, and at least one gas reservoir for supplying the gas flowing through the cathode tube are used, in which at least two cathode tubes are used that are electrically connected to one another, and in which each cathode tube has a separate actuator with which the amount of gas flowing through the respective cathode tube is set.