PLASMA POST-PROCESSING APPARATUS AND PLASMA POST-PROCESSING METHOD USING THE SAME

PLASMA POST-PROCESSING APPARATUS AND PLASMA POST-PROCESSING METHOD USING THE SAME

Disclosed is a plasma post-processing apparatus including a chamber, a stage disposed inside of the chamber, a work substrate disposed on the stage, diffusers each of which increases in width in a direction away from the work substrate and having holes, and disposed above the stage, transfer pipes r...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KIM, DAESOO, CHOI, DAEWON, KIM, SANGGAB
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Disclosed is a plasma post-processing apparatus including a chamber, a stage disposed inside of the chamber, a work substrate disposed on the stage, diffusers each of which increases in width in a direction away from the work substrate and having holes, and disposed above the stage, transfer pipes respectively connected to the diffusers, and plasma generators respectively connected to pipes that supply process gases and are respectively connected to the transfer pipes, and a diameter of the holes defined in a diffuser disposed at a center of the work substrate among the diffusers is less than a diameter of holes defined in each of remaining diffusers among the diffusers.