MACHINE LEARNING-BASED SYSTEMS AND METHODS FOR GENERATING SYNTHETIC DEFECT IMAGES FOR WAFER INSPECTION

An improved systems and methods for generating a synthetic defect image are disclosed. An improved method for generating a synthetic defect image comprises acquiring a machine learning-based generator model; providing a defect-free inspection image and a defect attribute combination as inputs to the...

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Bibliographische Detailangaben
Hauptverfasser: WANG, Zhe, PU, Lingling, YU, Liangjiang
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An improved systems and methods for generating a synthetic defect image are disclosed. An improved method for generating a synthetic defect image comprises acquiring a machine learning-based generator model; providing a defect-free inspection image and a defect attribute combination as inputs to the generator model; and generating by the generator model, based on the defect-free inspection image, a predicted synthetic defect image with a predicted defect that accords with the defect attribute combination.