METHOD OF PROCESSING LIQUID CONTAINING AMMONIA NITROGEN FROM SEMICONDUCTOR FABRICATION MACHINE

METHOD OF PROCESSING LIQUID CONTAINING AMMONIA NITROGEN FROM SEMICONDUCTOR FABRICATION MACHINE

The present disclosure provides a method of processing a liquid containing ammonia nitrogen from a first semiconductor fabrication machine. The method includes: adsorbing a plurality of ammonium (NH4+) ions in the liquid; desorbing the plurality of NH4+ ions to a solution; converting a fraction of t...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: LIN, EN TIAN, WENG, CHIAO-LING
Format: Patent
Sprache:eng
Schlagworte:
CHEMISTRY
METALLURGY
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Beschreibung
Zusammenfassung:The present disclosure provides a method of processing a liquid containing ammonia nitrogen from a first semiconductor fabrication machine. The method includes: adsorbing a plurality of ammonium (NH4+) ions in the liquid; desorbing the plurality of NH4+ ions to a solution; converting a fraction of the plurality of NH4+ ions into a plurality of ammonia (NH3) molecules; andelectrolyzing the plurality of NH3 molecules to become a plurality of hydrogen (H2) molecules and a plurality of nitrogen (N2) molecules.