IMAGING APPARATUS AND MANUFACTURING METHOD FOR IMAGING APPARATUS

Provided are an imaging apparatus and a manufacturing method for an imaging apparatus that are advantageous for acquiring a captured image in which an influence of a rays is suppressed. An imaging apparatus includes: a sensor substrate having a photoelectric conversion element on which image-capturi...

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Bibliographische Detailangaben
Hauptverfasser:	YAMAMOTO, Atsushi, MATSUGAI, Hiroyasu
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	Provided are an imaging apparatus and a manufacturing method for an imaging apparatus that are advantageous for acquiring a captured image in which an influence of a rays is suppressed. An imaging apparatus includes: a sensor substrate having a photoelectric conversion element on which image-capturing light is incident; a cover substrate that covers the photoelectric conversion element and transmits the image-capturing light; and an α-ray transmission preventive film that transmits the image-capturing light.