PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF

In a method of manufacturing a pellicle for an extreme ultraviolet (EUV) photomask, a nanotube layer including a plurality of carbon nanotubes is formed, the nanotube layer is attached to a pellicle frame, and a Joule hearting treatment is performed to the nanotube layer by applying electric current...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Lee, Hsin-Chang, HSU, Pei-Cheng, Sun, Ting-Pi
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOUNDS THEREOF
ELECTROGRAPHY
HOLOGRAPHY
INORGANIC CHEMISTRY
MATERIALS THEREFOR
METALLURGY
NON-METALLIC ELEMENTS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:In a method of manufacturing a pellicle for an extreme ultraviolet (EUV) photomask, a nanotube layer including a plurality of carbon nanotubes is formed, the nanotube layer is attached to a pellicle frame, and a Joule hearting treatment is performed to the nanotube layer by applying electric current through the nanotube layer.