SEMICONDUCTOR DEVICE
Provided is a semiconductor device in which each of a transistor portion and a diode portion has one or more trench contact portions provided from an upper surface of a semiconductor substrate in a depth direction of the semiconductor substrate, the transistor portion has a first bottom region of a...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Provided is a semiconductor device in which each of a transistor portion and a diode portion has one or more trench contact portions provided from an upper surface of a semiconductor substrate in a depth direction of the semiconductor substrate, the transistor portion has a first bottom region of a second conductivity type provided in contact with a bottom of any one of the one or more trench contact portions, the diode portion has a second bottom region of the second conductivity type provided in contact with a bottom of any one of the one or more trench contact portions, and a length of the first bottom region in the extending direction is larger than a length of the second bottom region in the extending direction. |
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