SKIN CLEANSING COMPOSITION

Disclosed is a skin cleansing composition comprising anionic surfactant selected from alkyl sulfates, alkyl ether sulfates, or a mixture thereof; polypropylene glycol; and diol; wherein the weight ratio of the diol to the anionic surfactant is at least 1:5.

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Bibliographische Detailangaben
Hauptverfasser: SUN, Yingqing, CAO, Yixuan, ZHU, Sunxin, SHENG, Saihong
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Disclosed is a skin cleansing composition comprising anionic surfactant selected from alkyl sulfates, alkyl ether sulfates, or a mixture thereof; polypropylene glycol; and diol; wherein the weight ratio of the diol to the anionic surfactant is at least 1:5.