CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a carboxylate represented by formula (I), a carboxylic acid generator and a resist composition:wherein L1 and L2 each represent a single bond or a hydrocarbon group which may have a substituent, -CH2- included in the hydrocarbon group may be replaced by -O-, -S-, -SO2- or -CO-, Ar1 rep...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Komuro, Katsuhiro, Ichikawa, Koji
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:Disclosed are a carboxylate represented by formula (I), a carboxylic acid generator and a resist composition:wherein L1 and L2 each represent a single bond or a hydrocarbon group which may have a substituent, -CH2- included in the hydrocarbon group may be replaced by -O-, -S-, -SO2- or -CO-, Ar1 represents an aromatic hydrocarbon group or a heterocyclic aromatic hydrocarbon group, R3 represents *-O-R10, *-O-CO-R10, etc., R10 represents an acid-labile group, R4 represents a halogen atom, a haloalkyl group or a hydrocarbon group, the hydrocarbon group may have a substituent, -CH2- included in the haloalkyl group and the hydrocarbon group may be replaced by -O-, -CO-, -S- or -SO2-, m4 represents an integer of 0 to 8, and Z+ represents an organic cation.