IN-SITU ALUMINIUM CLEANING USING ATOMIC LAYER ETCHING FOLLOWED BY ATOMIC LAYER DEPOSITION CAPPING FOR ENHANCED ALUMINIUM MIRRORS FOR VUV OPTICS

A method of making an enhanced aluminium mirror for vacuum ultraviolet (VUV) optics includes depositing a reflective coating comprising aluminium metal to at least one surface of a substrate through physical vapor deposition (PVD) to produce a mirror comprising the substrate and the reflective coati...

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Bibliographische Detailangaben
Hauptverfasser:	Borgharkar, Narendra Shamkant, Allen, Donald Erwin, Huang, Ming-Huang, Kim, Hoon, Wang, Jue
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method of making an enhanced aluminium mirror for vacuum ultraviolet (VUV) optics includes depositing a reflective coating comprising aluminium metal to at least one surface of a substrate through physical vapor deposition (PVD) to produce a mirror comprising the substrate and the reflective coating. The method further includes removing aluminium oxides from an outer surface of the reflective coating by conducting atomic layer etching (ALE) in an Atomic Layer Deposition (ALD) system to produce an etched surface of the reflective coating and depositing an ALD protective layer onto the etched surface of the reflective coating by conducting atomic layer deposition in the ALD system to produce the enhanced aluminium mirror. The enhanced aluminium mirror includes the substrate, the reflective coating deposited on the substrate, and the ALD protective layer covering the etched surface of the reflective coating.