APPLYING SYSTEM, APPLYING SUPPORT METHOD, AND STORAGE MEDIUM

An applying system includes the following. A drying apparatus dries a first applying material applied to a surface of a nail. An applying apparatus applies a second applying material on the surface of the nail with the first applying material dried by the drying apparatus in between.

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Bibliographische Detailangaben
1. Verfasser:	YAMASAKI, Shuichi
Format:	Patent
Sprache:	eng
Schlagworte:	CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING FUNCTIONAL ELEMENTS OF SUCH SYSTEMS HAIRDRESSING OR SHAVING EQUIPMENT HAND OR TRAVELLING ARTICLES HUMAN NECESSITIES MANICURING OR OTHER COSMETIC TREATMENT MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING
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Beschreibung
Zusammenfassung:	An applying system includes the following. A drying apparatus dries a first applying material applied to a surface of a nail. An applying apparatus applies a second applying material on the surface of the nail with the first applying material dried by the drying apparatus in between.