Fully open-air combustion deposition and rapid plasma treatment of metal oxides

Fabrication of thin-film metal oxide layers is performed by combining deposition of an oxidant-containing precursor, combustion of the precursor to form a thin-film metal oxide layer, and plasma treating the thin-film metal oxide layer. In one example, rapid fabrication of high-quality indium tin ox...

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Bibliographische Detailangaben
Hauptverfasser:	Miller, Robert D, Colburn, Thomas W, Dauskardt, Reinhold H, Rolston, Nicholas
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Fabrication of thin-film metal oxide layers is performed by combining deposition of an oxidant-containing precursor, combustion of the precursor to form a thin-film metal oxide layer, and plasma treating the thin-film metal oxide layer. In one example, rapid fabrication of high-quality indium tin oxide thin films is demonstrated.