INLINE CIRCUIT EDIT

Lithographic methodologies involving, and apparatuses suitable for, inline circuit edits are described. In an example, an integrated circuit structure includes a first conductive line and a second conductive line in a first dielectric layer, the second conductive line laterally spaced apart from the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BRISTOL, Robert L, LIVENGOOD, Richard H, TANNIRU, Mahesh, PEER, Akshit, KOBRINSKY, Mauro J, ENGEL, Clifford J, LIN, Kevin Lai
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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