SUBSTRATE PROCESSING COMPOSITION AND SUBSTRATE PROCESSING METHOD USING THE SAME

SUBSTRATE PROCESSING COMPOSITION AND SUBSTRATE PROCESSING METHOD USING THE SAME

There is provided a substrate processing composition for processing a substrate coated with a metal-containing resist composition. The substrate processing composition includes an organic solvent, an organic acid, and an additive. The additive includes a chelating agent made of quercetin and a deriv...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HAH, Junghwan, JO, Suyeon, YANG, Jinseok
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:There is provided a substrate processing composition for processing a substrate coated with a metal-containing resist composition. The substrate processing composition includes an organic solvent, an organic acid, and an additive. The additive includes a chelating agent made of quercetin and a derivative thereof and the content of the additive ranges 0.1 to 10% by mass relative to the total mass of the substrate processing composition.