SYNAPTIC DEVICE AND ITS MANUFACTURING METHOD

SYNAPTIC DEVICE AND ITS MANUFACTURING METHOD

Provided is a method of manufacturing a synaptic device. The method includes forming a first electrode, forming a synaptic mimic layer including a hole transport layer and an electron transport layer on the first electrode, and forming a second electrode on the synaptic mimic layer, wherein the form...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHUNG, Yong-Duck, LEE, Woo Jung, CHO, DAEHYUNG, HWANG, Taeha
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Provided is a method of manufacturing a synaptic device. The method includes forming a first electrode, forming a synaptic mimic layer including a hole transport layer and an electron transport layer on the first electrode, and forming a second electrode on the synaptic mimic layer, wherein the forming of the synaptic mimic layer includes forming the electron transport layer on the hole transport layer through a solution process.