APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

A substrate processing apparatus and method for increasing substrate processing efficiency are provided. The substrate processing apparatus comprises a process chamber, in which a reaction gas is processed to have a first pressure therein, a first pumping module for pumping the process chamber to ha...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Park, Wan Jae, Kim, Hyun Soo, Bae, Seong Hak, Lee, Jae Hoo, Han, Min Sung, Ju, Yoon Jong
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Beschreibung
Zusammenfassung:A substrate processing apparatus and method for increasing substrate processing efficiency are provided. The substrate processing apparatus comprises a process chamber, in which a reaction gas is processed to have a first pressure therein, a first pumping module for pumping the process chamber to have a second pressure smaller than the first pressure, a second pumping module for pumping the process chamber to have a third pressure smaller than the second pressure, and a first automatic pressure control module for adjusting a magnitude of the second pressure by adjusting a pumping pressure of the first pumping module.