CHAMBER COMPONENTS WITH POLISHED INTERNAL APERTURES

CHAMBER COMPONENTS WITH POLISHED INTERNAL APERTURES

Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Firouzdor, Vahid, Koonce, David, Kanungo, Biraja Prasad, Sun, Jennifer Y
Format: Patent
Sprache:eng
Schlagworte:
BORING
DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINE TOOLS
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
METAL-WORKING NOT OTHERWISE PROVIDED FOR
PERFORMING OPERATIONS
POLISHING
TRANSPORTING
TURNING
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Beschreibung
Zusammenfassung:Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 µin.